The original peer reviewed LK99 superconductor paper only briefly mentions the thin film work and measurements but this is the most important part as only the chemical vapor deposited thin film has ...
CRAIC Technologies has introduced CRAIC FilmPro™ film thickness measurement software. This software package is designed to plug-in to CRAIC Technology’s microspectrophotometers and their controlling ...
CRAIC Technologies has introduced CRAIC FilmPro™ film thickness measurement software. This software package is designed to plug-in to CRAIC Technology’s microspectrophotometers and their controlling ...
With its eye on advanced gates, copper, low-k processing and 300mm wafers and the associated technical challenges, such as measuring ultra-thin sub 2nm films and multi-layer filmstacks on the upper ...
Thin films are two-dimensional (2D) material layers deposited on a bulk substrate, possessing a thickness of a few nanometers to impart properties that cannot be realized by base materials. The unique ...
Nanoindentation is a measurement technique which is important in measuring Young’s modulus and hardness in thin films and any other situations involving the measurement of limited amounts of material.
Coatings and thin films are applied to the surface of materials to alter their properties. Being able to measure the thickness and uniformity of these thin films is important as variations can effect ...
Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...
Thin film thickness measurement on flat panel displays, MEMS and other semicon devices is a common requirement, so Elliot Scientific is now offering the new QDI 2010 Film microspectrophotometer. The ...
For many years, UV-VIS-NIR modular spectrometers have been used to measure thin films on surface. For example, in order to measure the transmittance and reflectance off a silicon wafer’s surface, the ...
HORIBA Jobin Yvon introduces the Auto SE a thin film measurement tool allowing analysis of samples. Sample analysis takes only a few seconds and provides a complete report of film thicknesses, optical ...
SAN JOSE — KLA-Tencor Corp. here has introduced a new option for its Aset-F5x thin-film metrology tool that measures wafer bow and wafer stress on 300-mm silicon substrates. KLA-Tencor said the option ...