Researchers at University of Tsukuba have developed a technology for real-time estimation of the valence state and growth rate of iron oxide thin films during their formation. This novel technology ...

Electron beam deposition occurs at high vacuum (10-7 Torr). A focused beam of high-energy electrons is directed to a crucible containing the ultra-high purity source material (such as gold). The beam ...

The Kurt J. Lesker Company ® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a ...

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Discover how KDF is balancing legacy expertise with forward-looking innovation to shape the future of thin-film deposition.

Physical vapor deposition has been the workhorse of the back-end-of-line for the copper damascene process. In this process, a structure undergoes a diffusion barrier etch step. Then, a via dielectric ...